New-generation microwave plasma cleaner shipped to customer site

On April 21, Wuxi Awing's newly developed new-generation microwave plasma cleaner was successfully shipped to a customer site in Hefei. With the rapid development of high-end integrated circuit chips, pin density keeps increasing, requirements regarding sensitivity to static electricity generated during the cleaning process are becoming ever stricter, and cleanliness requirements are rising accordingly. Conventional wet cleaning or 13.56MHz RF plasma cleaning can no longer fully meet these cleaning requirements, and so the microwave plasma cleaning process has emerged and is likely to become the next mainstream precision cleaning process. Compared with RF plasma cleaning, it offers the following advantages:

• High ion density, for faster and more uniform reactions
• Low self-bias voltage, with no electrostatic damage to the devices being cleaned
• Gentler cleaning, with no sputter contamination of the products being cleaned

New and existing customers are welcome to call us for consultation: 0510-83595266 18551045188