AW-MP Chamber Microwave Plasma Cleaner
The AW-MP60 brings microwave plasma to batch processing. A rotating tray at the bottom of the chamber and a ceramic plate on its side spread the microwave energy, with no internal electrode in the chamber.
Features
- No internal electrode — friendly to electrostatic-sensitive components
- High ionization and dissociation of the gas
- Multiple recipes stored and recalled in one step
- Full process control: set, modify and monitor parameters online
- Interlocks, fault alarms and real-time monitoring
- Shielding at the rear of the chamber against electromagnetic radiation
- Optional automatic door for later automation
| Parameter | AW-MP60 |
|---|---|
| Plasma source | 2.45 GHz microwave |
| Microwave power | 50–1000 W, adjustable |
| Chamber | L 400 × W 400 × H 400 mm |
| Microwave distribution | Rotating tray at the bottom; ceramic plate on the right side of the chamber for microwave diffusion |
| Vacuum system | Two-stage vacuum pump; imported pneumatic angle valve and vent valve; high-precision vacuum gauge |
| Gas system | O2 / Ar / H2, mass-flow controlled, 0–200 mL/min; polished stainless-steel lines |
| Control | Touchscreen + PLC, manual and automatic modes; optional industrial PC for MES connection |
| Dimensions | L 1000 × W 950 × H 1950 mm, including signal tower |
Specifications from the current Awing product literature. Confirm the configuration for your process in the quotation.
Batch treatment of parts that must not see an electrode or electrostatic discharge.
Related pages
LED / IGBT packaging · Semiconductor packaging
Selection guides
RF vs Microwave · Inline vs Chamber · Test & verification methods
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