AW-P00X R&D and Benchtop RF Plasma Cleaner
Compact 13.56 MHz RF plasma cleaners for R&D lines, laboratories and low-volume production: the P006 R&D chamber and the P15 benchtop unit.
Email:awingtech@wxawing.com
Phone:+86 510 8359 5266
Overview
Specifications
Applications
Overview
Two compact formats for development work and small batches: the AW-P006 R&D chamber and the AW-P15 benchtop cleaner with a modular design and up to five electrode layers.
Features
- Compact structure with a small footprint
- Flexible configuration and good value
- Suited to factory R&D lines, research laboratories and low-volume production
- P15: multi-functional modular design with a choice of chambers
- P15: 3.5- or 7-inch touchscreen, stores 50 sets of process parameters
- P15: square chamber with 1–5 electrode layers
Specifications
| Parameter | AW-P006 | AW-P15 |
|---|---|---|
| Plasma source | 13.56 MHz RF, automatic impedance matching | |
| RF power | 0–600 W / 1000 W, adjustable | 0–300 W, adjustable |
| Chamber | L 400 × W 280 × H 50 mm | L 275 × W 275 × H 200 mm |
| Vacuum system | Oil or dry pump; imported pneumatic angle valve and vent valve; high-precision vacuum gauge | |
| Gas system | Mass-flow controlled, 0–200 mL/min; polished stainless-steel gas lines and fittings | Mass-flow controller or needle-valve flowmeter; polished stainless-steel lines and fittings |
| Control | Touchscreen + PLC, manual and automatic modes | |
| Dimensions | L 850 × W 800 × H 1700 mm, including signal tower | L 600 × W 700 × H 750 mm |
Specifications from the current Awing product literature. Confirm the configuration for your process in the quotation.
Applications
Process development, sample runs and low-volume production.
Related pages
Test & verification methods · Semiconductor packaging
Selection guides
RF vs Microwave · Inline vs Chamber · Test & verification methods
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