Products
Plasma cleaning systems.
RF 13.56 MHz and microwave 2.45 GHz — in-line, continuous, chamber, R&D, desktop and single-wafer formats, designed and built in Wuxi.
AW-ZP In-line RF Plasma Cleaner
In-line 13.56 MHz RF plasma cleaner built around lead-frame strips: automatic loading, UPH above 500 (ZP04B, IC) or about 800 (ZP04A, LED).
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AW-LP Continuous RF Plasma Cleaner
Continuous 13.56 MHz RF plasma cleaner with tray transfer and left-in / right-out connection to the equipment before and after it.
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AW-ZMP In-line Microwave Plasma Cleaner
In-line 2.45 GHz microwave plasma cleaner for strips, with no internal electrode in the chamber — uniform, gentle cleaning without ESD issues.
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AW-P Chamber RF Plasma Cleaner
Batch chamber RF plasma cleaner with multi-layer electrodes and adjustable spacing, stored recipes and full process control. Models P100, P135 and P170.
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AW-MP Chamber Microwave Plasma Cleaner
Batch chamber 2.45 GHz microwave plasma cleaner with a rotating tray and ceramic microwave diffuser — no internal electrode, friendly to ESD-sensitive parts.
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AW-P00X R&D and Benchtop RF Plasma Cleaner
Compact 13.56 MHz RF plasma cleaners for R&D lines, laboratories and low-volume production: the P006 R&D chamber and the P15 benchtop unit.
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AW-DP Desktop Plasma Cleaner
Desktop 13.56 MHz RF plasma cleaner with a modular design, a choice of chambers and 1–5 electrode layers, storing 50 process recipes.
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AW-QP Single-Wafer Plasma Descum System
Single-wafer plasma descum and photoresist strip for 4-, 6- and 8-inch wafers: quartz and aluminum chamber, 13.56 MHz RF, 30–160 °C temperature control.
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