AW-ZMP In-line Microwave Plasma Cleaner
Microwave plasma without an internal electrode: nothing but the process gas is present in the chamber. The AW-ZMP04 cleans strips in line, evenly and gently, for parts that are sensitive to electrostatic discharge.
Features
- High ionization and dissociation of the gas, with uniform ion density
- No internal electrode — no contamination source in the chamber other than the process gas
- Strip microwave cleaning: more uniform and gentler, without ESD trouble
- High-voltage source isolated from the plasma generator
- Shielding at the rear of the chamber against electromagnetic radiation
- Interlocks, fault alarms and real-time monitoring
- Selective removal of contaminants by process choice
- User-friendly interface, easy to operate and maintain
| Parameter | AW-ZMP04 |
|---|---|
| Plasma source | 2.45 GHz microwave |
| Microwave power | 100–1000 W |
| Strip size | L 150–260 × W 30–80 mm |
| Chamber | L 550 × W 320 × H 50 mm |
| Vacuum system | Oil or dry pump; imported pneumatic angle valve and vent valve; high-precision vacuum gauge |
| Gas system | Mass-flow controlled, 0–200 mL/min; polished stainless-steel gas lines and fittings |
| Control | Touchscreen + PLC, manual and automatic modes; optional industrial PC for MES connection |
| Dimensions | L 1600 × W 1100 × H 1650 mm, excluding signal tower |
Specifications from the current Awing product literature. Confirm the configuration for your process in the quotation.
In-line cleaning of strips where parts are sensitive to electrostatic discharge, including LED packaging.
Related pages
LED / IGBT packaging · Semiconductor packaging
Selection guides
RF vs Microwave · Inline vs Chamber · Test & verification methods
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